发明名称 APPARATUS FOR MEASURING TEMPERATURE OF CHEMICAL DEPOSITION CHAMBER
摘要 PURPOSE: An apparatus for measuring temperature is provided to reduce the step numbers required to measure temperature by measuring temperature in a noncontacted state to a chuck. CONSTITUTION: In an apparatus for measuring temperature, an infrared ray sensor(26) is fixed at an external periphery of a deposition chamber(20), and senses temperature in a noncontacted state with a chuck(22). An amplifier(28) amplifies an output signal of the infrared ray sensor, and a filter part(30) compares the amplified signal with a predetermined reference level to output a signal having a proper code. A microcomputer(32) reads information which is stored at an address corresponding to the proper code of the signal from the filter part. A decoder(34) decodes an output signal from the microcomputer, and a display(36) receives the decoded signal to display a measured value corresponding to the decoded signal.
申请公布号 KR20000020813(A) 申请公布日期 2000.04.15
申请号 KR19980039594 申请日期 1998.09.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG, JONG MO
分类号 G01J5/00 主分类号 G01J5/00
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