发明名称 HORIZONTAL TYPE DIFFUSION MOS(METAL OXIDE SEMICONDUCTOR) TRANSISTOR WITH PROTECT DIODE AND METHOD FOR MANUFACTURING THEREOF
摘要 PURPOSE: A horizontal type diffusion MOS transistor with protect diode and method for manufacturing thereof are provided to prevent the damage of a gate insulation film due to the concentration of the electric field according to the breakdown voltage within the device. CONSTITUTION: A horizontal type diffusion MOS transistor with protect diode comprises a first conductive type semiconductor substrate(2), a second conductive type embedded layer(4), a first conductive type bottom area(8), a second conductive type epitaxial layer(10) and a first conductive type body area(18). The portion which the embedded layer and the bottom area are contacted to is a protect diode.
申请公布号 KR20000019884(A) 申请公布日期 2000.04.15
申请号 KR19980038207 申请日期 1998.09.16
申请人 FAIRCHILD KOREA SEMICONDUCTOR LTD. 发明人 KIM, YONG DON;LEE, SUN HAK
分类号 H01L21/336;(IPC1-7):H01L21/336 主分类号 H01L21/336
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