发明名称 |
HORIZONTAL TYPE DIFFUSION MOS(METAL OXIDE SEMICONDUCTOR) TRANSISTOR WITH PROTECT DIODE AND METHOD FOR MANUFACTURING THEREOF |
摘要 |
PURPOSE: A horizontal type diffusion MOS transistor with protect diode and method for manufacturing thereof are provided to prevent the damage of a gate insulation film due to the concentration of the electric field according to the breakdown voltage within the device. CONSTITUTION: A horizontal type diffusion MOS transistor with protect diode comprises a first conductive type semiconductor substrate(2), a second conductive type embedded layer(4), a first conductive type bottom area(8), a second conductive type epitaxial layer(10) and a first conductive type body area(18). The portion which the embedded layer and the bottom area are contacted to is a protect diode.
|
申请公布号 |
KR20000019884(A) |
申请公布日期 |
2000.04.15 |
申请号 |
KR19980038207 |
申请日期 |
1998.09.16 |
申请人 |
FAIRCHILD KOREA SEMICONDUCTOR LTD. |
发明人 |
KIM, YONG DON;LEE, SUN HAK |
分类号 |
H01L21/336;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|