发明名称 ION DOPING APPARATUS AND METHOD FOR AERODYNAMIC FLOW CONTROL
摘要 <p>Method and apparatus for impingement on the sonic wave produced by a supersonic gas flow and the gas flow in a boundary layer of a gas that interfaces with a solid substrate comprising providing a source of a mixture of ions and electrons, introducing said ions and electrons into the region behind the sonic wave and ahead of the boundary layer, separating said ions and said electrons in said region maintaining a substantial portion of said ions proximate said region and maintaining a substantial portion of said electrons remote from said region.</p>
申请公布号 WO2000020274(A2) 申请公布日期 2000.04.13
申请号 US1999020878 申请日期 1999.09.22
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