| 摘要 |
A workpiece is patterned in accordance with the lateral pattern of a spatially selective, electrically charged, scanning beam of actinic radiation by:- (1) directing the beam at a major surface of a conductive layer (13) that is located overlying a resist layer (11) that is sensitive to the beam, the conductive layer being transparent to the beam, the resist layer being located overlying the workpiece; (2) removing the entire thickness of the conductive layer by means of dry etching; (3) developing the resist layer, whereby the resist layer becomes a patterned resist layer in accordance with the pattern of the beam. |
