发明名称 Charged-particle-beam optical system
摘要 Charged-particle-beam optical systems are disclosed exhibiting reduced aberrations. Such a system comprises a symmetric magnetic doublet type projection lens system and deflectors. An imaginary Z-axis is superimposed on the optical axis with an origin at an image-crossover point. Excitation of the deflectors and lenses is controlled by a controller so that the ratio of G1(Z) to G2(-MxZ) is substantially equal to the ratio of (-M) to 1 (i.e., G1(Z):G2(-MxZ)=(-M):1), and the deflection trajectory of the charged-particle beam intersects with the optical axis at a crossover Zc, where M is the magnification of the lens system, G1(Z) is the distribution of the deflective magnetic field formed on the object side of the crossover, and G2(Z) is the distribution of the deflective magnetic field formed on the image side of the crossover.
申请公布号 US6049084(A) 申请公布日期 2000.04.11
申请号 US19980049602 申请日期 1998.03.27
申请人 NIKON CORPORATION 发明人 SIMIZU, HIROYASU
分类号 G21K5/04;G03F7/20;G21K1/093;H01J37/141;H01J37/147;H01J37/153;H01J37/30;H01J37/305;H01L21/027;(IPC1-7):H01J37/153;H01J3/20;G21K1/08 主分类号 G21K5/04
代理机构 代理人
主权项
地址