发明名称 DEFECT INSPECTING DEVICE AND METHOD
摘要 PROBLEM TO BE SOLVED: To quickly and precisely inspect a defect such as a very small contaminant by calculating dispersion based on signals in a portion with the same circuit patterns formed or in its vicinity, and by extracting a signal indicating the defect such as the very small contaminant out of detected signals based on a threshold set on the basis of a result calculated hereinbefore. SOLUTION: An illumination optical system 100 having a laser beam 101, lenses 102-104, a beam splitter and the like has a precdribed inclination with respect to a main straight line group of a circuit pattern, and an inspected objective substrate 1 is irradiated subtantially orthogonally to a traveling direction of a substrate mounting table 304 for mounting the objective substrate 1. An inspecting optical system 200 detects reflected scattered light provided by a defect such as a contaminant existing on the substrate 1, using image sensors 205, 206 through lenses 201, 203 and a beam aplitter 204, to feed signals to a processing circuit 400. A threshold as a determination reference is set in a defect determining process in the circuit 400 based on a dispersion of the resulting signals, and the signal indicating the defect such as the contaminant is extracted, based on the set threshold.
申请公布号 JP2000105203(A) 申请公布日期 2000.04.11
申请号 JP19990206078 申请日期 1999.07.21
申请人 HITACHI LTD;HITACHI ELECTRONICS ENG CO LTD 发明人 NOGUCHI MINORU;OSHIMA YOSHIMASA;NISHIYAMA HIDETOSHI;MATSUMOTO SHUNICHI;KENBO YUKIO;MATSUNAGA RYOJI;SAKAI SHIGETOSHI;NINOMIYA TAKANORI;WATANABE TETSUYA;NAKAMURA HISATO;JINGU TAKAHIRO;MORISHIGE YOSHIO;CHIKAMATSU SHUICHI
分类号 G01B11/30;G01N21/956;H01L21/66;(IPC1-7):G01N21/956 主分类号 G01B11/30
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