| 发明名称 |
Washing apparatus and washing method |
| 摘要 |
The present invention is directed to providing an apparatus which is improved so as to remove a contamination on a substrate efficiently. This apparatus includes a jet nozzle jetting out droplets toward a substrate. A liquid supply device and a gas supply device are connected to the jet nozzle. A mixing device mixing a liquid and a gas supplied to the jet nozzle and changing the liquid into the droplets is provided in the jet nozzle.
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| 申请公布号 |
US6048409(A) |
申请公布日期 |
2000.04.11 |
| 申请号 |
US19970917103 |
申请日期 |
1997.08.25 |
| 申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA;RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORPORATION |
发明人 |
KANNO, ITARU;OHMORI, TOSHIAKI;TANAKA, HIROSHI;DOI, NOBUAKI |
| 分类号 |
B08B5/02;A62C5/00;B01F3/04;B01F5/04;B01F5/06;B05B7/00;B05D1/02;B08B3/02;B08B3/10;B24B53/007;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):B08B3/02 |
主分类号 |
B08B5/02 |
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