| 摘要 |
PROBLEM TO BE SOLVED: To improve throughput by performing exposure and alignment information detection, in parallel with respect to two wafers which are to be exposed. SOLUTION: An optical system PL and first and second alignment optical systems AA1a, AA1b, AA2a, and AA2b are so provided that detection of alignment information for one wafer W2 (W1) is performed in parallel, when the other wafer W1 (W2) which is held side by side on a wafer stage ST is exposed with a mask pattern. Using the alignment information acquired during exposure, positioning is performed with the wafer for mask pattern exposure. Position detecting means 11 and 12 for the wafer stage ST, which are used for positioning at an exposure position and position detecting means 11 and 13 (11 and 14) for the wafer stage ST, which are used for alignment information detection at an alignment position, are so provided that Abbe error is almost zero relative to the exposure position and alignment position, respectively. |
