| 摘要 |
PROBLEM TO BE SOLVED: To perform cleaning of the surface and groove inside of a substrate at the same time and also to prevent fine particles once removed from being restuck to enable performing washing of high cleaning degree. SOLUTION: This washer is equipped with a substrate holding part for holding a substrate W and a washing utensil disposed on the surface of the substrate W so as to make it slidable. The washing utensil has a high pressure nozzle 36 for jetting high pressure washing liquid toward the substrate W and a cylindrical washing body 42 surrounding the periphery of the high pressure nozzle 36. In this way, scrub washing and high pressure liquid washing of the substrate are performed at the same time to perform cleaning of the surface and the groove inside of the substrate at the same time and also by feeding liquid from inside the washing body, fine particles are prevented from being restuck due to the concentration of the soil of the washing body to enable washing of high washing degree.
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