摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pattern inspection device which determines the occurrence of a defect with high accuracy, related to a minute pattern added with an optical proximity correction pattern. SOLUTION: This pattern inspection device comprises a design-side data generating part, which generates a design-side data based on a design pattern data, a measurement data generating part which generates a measurement data for generating a measurement pattern data corresponding to the pattern of a sample to be measured, and a comparison circuit which compares the design-side data to the measurement data. Here, the design-side data generating part comprises a design data developing means 31 which develops the design pattern data and design data correcting means 33 and 36 which detect an addition pattern part for optical proximity correction from the image data of the design pattern developed by the design data developing means 31 and adds corrections to that part, according to the addition pattern.</p> |