| 摘要 |
PROBLEM TO BE SOLVED: To decrease the number of production stages by decreasing the number of times of forming photoresist films of a liquid crystal display device of an active matrix system having thin-film transistors (TFTs). SOLUTION: This display panel is constituted by forming gate electrodes G on a glass substrate 1, depositing a gate insulating film 31 and a semiconductor film 34 consisting of amorphous silicon, forming a blocking layer 32 on the semiconductor film 34, forming drain electrodes D and source electrodes S consisting of an n+ silicon film 54 as the lowermost layer, removing the unnecessary portions of the deposited semiconductor film 34, depositing an over-coating film 41, forming contact holes 61 in the over-coating film 41 and connecting pixel electrodes 7 via these contact holes 61 to the source electrodes S on the over-coating film 41. In such a case, the photoresist films are formed five times.
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