| 摘要 |
The invention relates to a composition, which is primarily energy sensitive in the near infrared and infrared region, and which comprises a dual polymer system, an infrared absorbing material that absorbs at the desired wavelength, an acid generating compound, and, optionally, an acid stabilizing compound. The composition may be applied to the proper substrate and is useful to provide offset lithographic printing plates, color proofing film or photoresist. |
