发明名称 PLASMA TREATING UNIT AND PLASMA TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To lessen the charge up damages of the surface of a workpiece, when performing the etching, cleaning, or the like of the workpiece, by drawing negative ions out of a plasma. SOLUTION: First, in a plasma generation chamber 103, plasma is generated by the introduction of a specified gas and the application of high frequency power. Then, the generated plasma is diffused in the treatment space 105 of the substance 109 to be processed, which is positioned downstream when viewed from the plasma generation space 103. Here, positive ions and electrons are generated in the plasma generation part, but at the space apart from the plasma generation part, the generation of negative ions by the recombination between positive ions and electrons and the coupling of neutral atoms, molecules, and electrons occurs. Only the negative ions are drawn out accelerated in the direction of the workpiece 109 from the plasma, including a large quantity of ions generated this way by applying positive voltage with a grid electrode 108.
申请公布号 JP2000100798(A) 申请公布日期 2000.04.07
申请号 JP19990074936 申请日期 1999.03.19
申请人 CANON INC 发明人 KITAGAWA HIDEO
分类号 H01L21/302;H01L21/3065;H05H1/46 主分类号 H01L21/302
代理机构 代理人
主权项
地址