| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam aligner wherein blur and distortion of an image caused by deflection aberration is suppressed for large deflection amount even when an aperture half angle of electron beam is large. SOLUTION: An electron beam projected on a mask 1 surface transfers the image of pattern formed on the mask 1 onto a sensitized substrate 2 through action of transfer lenses 4 and 5. Six deflectors 7 are provided on a mask side while three on a sensitized substrate side with a scatter aperture 6 is between. Using nine deflectors 7 in total, inclination of a small region image surface due to deflection, deflection coma aberration, a small region astigmatic difference due to deflection, deflection chromatic aberration, small region secondary distortion due to deflection (each one in x, y direction), passing of electron ray at the center of scatter aperture, deflection to target's deflection position on a substrate, and verticality (telecentricity) of incident angle of the electron ray to the sensitized substrate surface are within the design condition.
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