发明名称 REFLECTION/REDUCTION PROJECTION OPTICAL SYSTEM, PROJECTION ALIGNER COMPRISING IT, AND EXPOSURE METHOD USING THE ALIGNER
摘要 PROBLEM TO BE SOLVED: To provide excellent imaging performance with about six reflection surfaces while minimizing the diameter of reflection mirror. SOLUTION: Related to a reflection/reduction imaging optical system 100 which, comprising a first reflection optical system 10 for imaging the object on a first surface R onto a second surface and a second reflection optical system 20 for imaging the image on the second surface onto a third surface W, forms a reduced image of the object of the first surface R onto the third surface W, the first reflection optical system 10 comprises a first mirror pair comprising two reflection mirrors M1 and M2, the second reflection optical system 20 comprises a second mirror comprising two reflection mirrors M3 and M4 and a third mirror pair comprising to reflection mirrors M5 and M6, and the light from the first surface R forms an intermediate image on the second surface by way of the first mirror pair, while the light from the intermediate image is guided to the third surface W by way of the second and third mirror pairs, in this order.
申请公布号 JP2000100694(A) 申请公布日期 2000.04.07
申请号 JP19980267706 申请日期 1998.09.22
申请人 NIKON CORP 发明人 TAKAHASHI YUTO
分类号 H01L21/027;G02B17/06;G02B17/08;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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