| 摘要 |
PROBLEM TO BE SOLVED: To prevent mist, sprayed out of a high-pressure spray outlet from leakage to the outside of a cup and the humidity outside of the cup, from rising by providing a structure so as to cover the cup from the upper part of the high-pressure spray outlet to the lower part of a wafer stage. SOLUTION: This development processing device 2 has a wafer stage 11 which rotates a wafer W by holding it roughly horizontally, a development cup 12 which covers the wafer W from the peripheral part of the wafer stage 11 to the lower part of it, and a high-pressure spray outlet 16 for spraying mist state pure water on the surface of the wafer W supported on the wafer stage 11. In this case, at the outside of the development cup 12 is provided a cup 31 which covers the wafer W from a high-pressure spray outlet to the lower part of the wafer stage 11 downward and to the peripheral part of the development cup 12 horizontally. An exhaust hole 32 is provided on the sidewalls of the cup 31 for exhausting mist 'm' over the wafer W. |
