| 摘要 |
<p>PROBLEM TO BE SOLVED: To decrease the charge amt., to avoid charging and discharging due to contact or the like, and to obtain a mask with decreased dielectric breakdown by removing chromium on the peripheral part of a mask which is preliminarily covered with chromium to the peripheral part of a glass substrate so as to leave chromium only in the necessary light-shielding zone. SOLUTION: The photomask has a structure in which chromium is removed except for a required light-shielding zone. Namely, by forming a glass part 4 where unnecessary chromium is removed, the amt. of charges accumulated in the chromium in the light-shielding zone 1 can be decreased as well as charging and discharging due to contact or handling can be avoided. Thereby, dielectric breakdown between the chromium in the light-shielding zone 1 and the product pattern 2 can be decreased. By removing chromium in the peripheral part while leaving chromium only in the necessary light-shielding zone 1 as above described, charges accumulated in the chromium in the light-shielding zone can be decreased and charging and discharging due to contact can be prevented. Thereby, dielectric breakdown of chromium can be decreased.</p> |
