| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a superior sealing means for a substrate treating device. SOLUTION: A rotary sealing mechanism 10 is provided with a rotating-side annular surface 11 which is provided on the spin base 4 of a spin chuck, a nonrotating-side annular surface 12 which is provided on a base section 6 so that the surface 12 may be faced oppositely to the surface 11, a coil spring 13 which exerts an force F1 for bringing the surfaces 11 and 12 closer to each other, and a gas supply mechanism which supplies a gas between the surfaces 11 and 12. The spin chuck is rotated in a non-contacting state by supplying the gas between the surfaces 11 and 12, and forming a small clearance between the surfaces 11 and 12 by balancing the separating force F2 which is generated by the supplied gas to separate the surfaces 11 and 12 from each other and the approaching force F1 exerted from the coil spring 13 with each other.</p> |
