发明名称 MECHANISM AND METHOD FOR MATCHING WORK WITH MASK
摘要 PROBLEM TO BE SOLVED: To provide a mechanism and a method for matching work with mask capable of dealing with such a case that a work mark and a mask mark overlap each other on a border line and both the marks can not be properly recognized, even without forming the work mark or mask mark of a large diameter. SOLUTION: Concerning a matching mechanism 1 provided with image pickup means 2 and 2 for picking up the images of mask mark Mm and work mark Wm, a control mechanism 7 for recognizing the positions of both the said image picked-up marks and a moving means 11 (10) for matching the position deviation of both the marks corresponding to a control signal from this control mechanism 7, this mechanism is constituted as the matching mechanism of work with mask Wm for performing the matching of both the marks by operating the position deviation amount of both the said marks after performing separate recognition from the mask mark along with the border line of the recognizable work mark from the said work mark Wm and matching that work mark with the separated shape of the mask mark Mm separated by the said border line when the mask mark Mm is overlapped on the border line of the work mark Wm and the respective marks can not be properly recognized.
申请公布号 JP2000099159(A) 申请公布日期 2000.04.07
申请号 JP19980265034 申请日期 1998.09.18
申请人 ORC MFG CO LTD 发明人 OKAMURA TAKEHIKO;KANDA YUKIHIRO
分类号 H04N7/18;G01B11/00;G01B21/00;G03F9/00;G05B19/19;G05D3/12;H01L21/027;(IPC1-7):G05D3/12 主分类号 H04N7/18
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