| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a treatment device which has high latitude in the addition of a treatment unit, enables step-by-step expansion, is easy to optimize the number of units to a necessary tact and can reduce installation space. SOLUTION: This treatment device carries out resist application, exposure and development to a substrate S, after exposure. It has a main carrying line L for carrying the substrate S, an application treatment block 22 which is formed by arranging a plurality of resist application treatment units 221, an exposure block 23 formed by arranging a plurality of exposure units 231 which exposes a specified pattern to applied resist, a development treatment block 24 formed by arranging a plurality of development treatment units 241 which perform development after exposure and delivery boats 35a, 35b, 36a, 36b, 37a, 37b, 38a, 38b which deliver the substrate S between the main carrying line L and each block.</p> |
