MARK FOR MASK ALIGNMENT

摘要

PURPOSE: A mark for mask alignment is provided to simultaneously measure position deviation and revolving deviation on an X-Y plane of a mask to a wafer and align the mask. CONSTITUTION: A mark for mask alignment comprises a circular pattern(11a) on a concentric circle, and a straight pattern(11b) surrounding the circular pattern on a tetragon. A mask is installed in a holder and the object mounted upon the holder. Light transmittance is varied according to an overlapping degree to measure a position aligning state of the mask to the exposing object.