发明名称 Chemical mechanical polishing (CMP) system for semiconductor wafer
摘要 <p>The system has a carrier assembly with perforations for distributing downward pressure on the semiconductor wafer. The system has a polishing pad, a polishing arm, and a carrier assembly. The carrier assembly includes perforations, and a plug for plugging selected perforations comprising a pressure resistant portion, a bottom portion attached to the pressure resistant portion, and a leak resistant portion extending from the pressure resistant portion, dimensioned to fit snugly into the bottom portion.</p>
申请公布号 DE19842954(A1) 申请公布日期 2000.04.06
申请号 DE1998142954 申请日期 1998.09.18
申请人 MOSEL VITELIC INC.;PROMOS TECHNOLOGIES, INC.;SIEMENS AG 发明人 PENG, CHENG-AN
分类号 B24B37/30;B24B49/16;H01L21/00;(IPC1-7):H01L21/302;B24B37/04;B24B7/16 主分类号 B24B37/30
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