发明名称 APPARATUS AND METHOD FOR PRODUCING PLANE-PARALLEL FLAKES
摘要 An apparatus and method technique for producing plane-parallel flakes is disclosed. In a preferred embodiment, the present invention is realized through a multi-chamber apparatus for producing plane-parallel flakes from layers vapor deposited in vacuum on an endlessly circulating substrate. The present invention includes the sequential steps of: vapor deposition of a separating agent layer in high vacuum on the endlessly circulating substrate; vapor deposition of one or more layers of metal, oxides, fluoride, and nitrides in high vacuum on the separating agent layer; and stripping the vapor deposited layers from the endlessly circulating substrate under low vacuum. The vapor deposited layers are subsequently present in a separate vacuum stage separated from the vapor deposition chamber by dynamic locks as a suspension of fine flakes in a mixture of solvent and separating agent. The suspension may continuously or intermittently be transferred out of the separate vacuum stage for further processing. The solvent may be water in a vacuum environment of more than 20 mbar or secondary or tertiary alcohols at more than 0.05 mbar.
申请公布号 WO0018978(A1) 申请公布日期 2000.04.06
申请号 WO1999IB01656 申请日期 1999.09.23
申请人 WEINERT VAKUUM VERFAHRENSTECHNIK GMBH 发明人 WEINERT, HILMAR, H.
分类号 C23C14/58;B22F1/00;C09C1/00;C23C14/00;C23C14/56 主分类号 C23C14/58
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