| 摘要 |
According to the inventive method for producing a micromechanical rotation rate sensor, a wafer stack arrangement is used wherein a substrate wafer arrangement (12, 16) is connected to a structural wafer arrangement (14, 18) by an insulating connecting layer (15). The required thickness of the structural wafer arrangement (14, 18) is achieved by thinning it out, and the structural wafer arrangement is then structured in order to define at least one seismic mass (20), a suspension device (24) and a spring device (22a, 22b) which connects the seismic mass to the suspension device. The connecting layer acts as an etch stop for a dry-etching method in which the structural wafer arrangement is structured. In a subsequent further dry-etching step, the connecting layer is selectively removed in such a way that the seismic mass can perform an excitation oscillation and the seismic mass or parts thereof can carry out a detection oscillation as a result of a Coriolis force in relation to the substrate wafer arrangement. The wafer stack arrangement makes it possible to e.g. integrate a monolithic circuit into the substrate wafer before the wafers are connected and to apply a metallic coating to the substrate wafer. Said metallic coating can also be structured before the wafers are connected, in order to produce e.g. detection electrodes for a capacitive detection method.
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