| 摘要 |
PURPOSE: A wafer cooling installation is provided to minimize pressure difference between front and rear pressure controllers in a cooling gas supply line while starting a fabricating process of a new wafer after completion of the process. CONSTITUTION: A wafer cooling installation comprises a reacting chamber, a wafer chuck installed in the reacting chamber, a manometer sequentially coupled to the wafer chuck, a pressure controller, and a primary valve. A bypass gas line is coupled between the pressure controller and the primary valve and a bypass valve is installed in the bypass gas line. A first and a second valves are coupled in the wafer chuck in parallel.
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