CHEMICAL VAPOR DEPOSITION APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES

摘要

PURPOSE: A CVD apparatus used for fabricating semiconductor devices is provided to minimize cassette failure by easily analyzing standby state of a cassette using a cassette shuttle. CONSTITUTION: An apparatus comprises a cassette(10) for loading a plurality of wafers(12),a cassette shuttle(1) for enabling the cassette(10) to standby, and a display(14) for differently displaying signals in accordance with the standby state of the cassette shuttle(1) and formed on the upper part of the cassette shuttle(1).