发明名称 |
DECHUCKING METHOD AND APPARATUS FOR WORKPIECES IN VACUUM PROCESSORS |
摘要 |
<p>A glass workpiece being processed in a vacuum plasma processing chamber is dechucked from a monopolar electrostatic chuck by gradually reducing the chucking voltage during processing while maintaining the voltage high enough to clamp the workpiece. A reverse polarity voltage applied to the chuck at the end of processing assists in dechucking. The workpiece temperature is maintained at a high value at the end of processing to assisting in dechucking. Peak current flowing through the chuck during lifting of the workpiece from the chuck controls the amplitude and/or duration of the reverse polarity voltage during the next dechucking operation.</p> |
申请公布号 |
WO0019592(A1) |
申请公布日期 |
2000.04.06 |
申请号 |
WO1999US20637 |
申请日期 |
1999.09.10 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
HOWALD, ARTHUR, M.;HOLLAND, JOHN, P. |
分类号 |
C23C16/458;H01L21/00;H01L21/302;H01L21/3065;H01L21/31;H01L21/683;H02N13/00;(IPC1-7):H02N13/00;H01L21/68 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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