发明名称 |
COATING FLUID FOR FORMING LOW-PERMITTIVITY SILICA-BASED COATING FILM AND SUBSTRATE WITH LOW-PERMITTIVITY COATING FILM |
摘要 |
<p>A coating fluid capable of forming a silica-based coating film having a relative permittivity as low as 3 or below and a low density and excellent in resistance to oxygen plasma and suitability for other processings; and a substrate having a coating film having such properties. The coating fluid is characterized by comprising a polymer composition comprising (i) an alkoxysilane represented by the following general formula (I) and/or a hydrolyzate of at least one halogenated silane represented by the following general formula (II) and (ii) a readily decomposable resin. In the formulas (I): XnSi(OR)4-n and (II) XnSiX'4-n X represents hydrogen, fluorine, C1-8 alkyl, fluoroalkyl, aryl or vinyl; R represents hydrogen, C1-8 alkyl, aryl, or vinyl; X' represents halogeno; and n is an integer of 0 to 3.</p> |
申请公布号 |
WO0018847(A1) |
申请公布日期 |
2000.04.06 |
申请号 |
WO1999JP04051 |
申请日期 |
1999.07.28 |
申请人 |
CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.;KOMATSU, MICHIO;NAKASHIMA, AKIRA;EGAMI, MIKI |
发明人 |
KOMATSU, MICHIO;NAKASHIMA, AKIRA;EGAMI, MIKI |
分类号 |
C09D5/25;C09D183/04;H01L21/312;(IPC1-7):C09D183/04;H05K3/46 |
主分类号 |
C09D5/25 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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