发明名称 Passivation technology combining improved adhesion in passivation and a scribe street without passivation
摘要 An integrated circuit passivation layer including a first passivation layer portion of silicon nitride treated with nitrous oxide and a second passivation layer portion of polyimide. Also, a method of passivating an integrated circuit wafer including depositing a first passivation layer over the top surface of an integrated circuit wafer having a scribe street area between adjacent integrated circuit device portions, depositing a second passivation layer over the first passivation layer, and patterning the first passivation layer and the second passivation layer to expose the scribe street area.
申请公布号 US6046101(A) 申请公布日期 2000.04.04
申请号 US19970197097 申请日期 1997.12.31
申请人 INTEL CORPORATION 发明人 DASS, M. LAWRENCE A.;SESHAN, KRISHNA;GAETA, ISAURA
分类号 H01L21/301;H01L21/312;H01L21/318;H01L23/31;(IPC1-7):H01L21/318;H01L21/70 主分类号 H01L21/301
代理机构 代理人
主权项
地址