发明名称 |
Synthetic silica glass manufacturing apparatus |
摘要 |
An apparatus is provided for synthesizing a silica glass ingot. The appartus includes a stage having a target plate thereover, the target plate being rotatable relative to the stage around a predetermined vertical axis, and a furnace for reacting material gas with combustion gas to synthesize the silica glass ingot on the target plate; the furnace having an opening at its bottom. The appratus further includes an elevation system that moves the stage in a vertical direction parallel to the predetermined vertical axis so as to vertically move the target plate through the opening of the furnace, the elevation system supporting the stage from at least one side of the stage and lacking a structure directly below the stage that would substantially interfere with the vertical movement of the stage.
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申请公布号 |
US6044664(A) |
申请公布日期 |
2000.04.04 |
申请号 |
US19980161490 |
申请日期 |
1998.09.28 |
申请人 |
NIKON CORPORATION |
发明人 |
YAJIMA, SHOUJI;YAMAGUCHI, NORIHISA;NAKAGAWA, KAZUHIRO;JINBO, HIROKI |
分类号 |
C03B19/14;(IPC1-7):C03B37/018;F16M11/24 |
主分类号 |
C03B19/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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