发明名称 METHOD FOR PRINTING, PRINTER, MASK PLATE, AND MASK PLATE FOR PRINTING
摘要 PROBLEM TO BE SOLVED: To provide a method for printing and a printer capable of reducing a deterioration of printing quality near a center of a material to be printed or print omission, and a mask plate, and a mask plate for printing used for the method. SOLUTION: A columnar contact member 6 having rigidity is moved toward an excimer laser mask 1b according to a deflection amount of a wafer 5 at a squeegee surface side of the mask 1b, and softly touched to the vicinity of a center of the mask 1b. When the wafer 5 and the member 6 are further moved to a lower side, the wafer 5 and the mask 1b start separating. The vicinity of the center of the mask 1b can generate an excess acceleration directed toward an upper side in the drawing at an instantaneous moment of separating the wafer 5 caused by an increase in an elastically extending force of the deflection, but is controlled so that the member 6 may not be moved at the excess acceleration by the contact with the member 6.
申请公布号 JP2000094636(A) 申请公布日期 2000.04.04
申请号 JP19980274331 申请日期 1998.09.10
申请人 RICOH MICROELECTRONICS CO LTD 发明人 KINOSHITA SHINGEN
分类号 B41F15/08;B41F15/40;B41M1/12;B41N1/24;H05K3/12;H05K3/34;(IPC1-7):B41F15/40 主分类号 B41F15/08
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