发明名称 APPARATUS FOR PRODUCING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To circulate, filter, or replace a chemical liquid in a tank efficiently in a short time and to keep the purity and clarity of a cleaning liquid uniform by forming protruding openings in a proper number of places in the side wall of a cleaning tank in an apparatus for cleaning the surface of an object to be cleaned while the object is being immersed in liquid being allowed to over flow. SOLUTION: A protruding opening 101 for generating the convection of liquid to a tank lower part, a protruding opening 102 for generating convection to an overflow part 104, and a protruding opening 103 for leading the flow of a chemical liquid surface to a discharge opening 114 are formed. A cleaning liquid introduced from the opening 102 is made to flow convectively in a straight line toward the opposite surface 112 of a tank. The surface 112 is tapered toward the overflow part 104 in a tank upper part, and the liquid which collided is made to flow along an upper part wall surface 112. Moreover, the liquid introduced from the opening 101 is made to collide with an opposite surface 113, made to flow along a tank wall 113 reversely tapered toward a tank bottom part, and discharged from a discharge opening 105(b), In this way, the convection of the liquid in a cleaning tank is changed, and the liquid is treated uniformly.
申请公布号 JP2000093906(A) 申请公布日期 2000.04.04
申请号 JP19980272111 申请日期 1998.09.25
申请人 SEIKO EPSON CORP 发明人 SHINDO AKINORI
分类号 B08B3/04;H01L21/304;(IPC1-7):B08B3/04 主分类号 B08B3/04
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