FORMATION OF POLYMER PATTERN

摘要

PROBLEM TO BE SOLVED: To easily form a polymer pattern at a low cost. SOLUTION: This method for forming a polymer pattern comprises selectively irradiating the pattern formation-predetermined regions 57 of a substrate 51 containing a radical-polymerizable monomer 53 and a free radical-generating agent 53 with light. Thereby, free radicals are generated to addition-polymerize the radiacal-polymerizable monomer 53 by the free radical mechanism, thus forming the polymer of the radical-polymerizable monomer to give the polymer pattern 61.