发明名称 Trench-gated MOSFET with integral temperature detection diode
摘要 A vertical N-channel trenched-gate power MOSFET includes an integral temperature detection diode. The diode includes an N+ region which serves as the cathode and which is formed within a tub of P-type material, which serves as the anode. The N+ region is separated from the trench. The anode of the temperature detection diode may be shorted to the source or may be separately biased. The temperature of the MOSFET is monitored by supplying a current through the diode in the forward direction and measuring the voltage across the forward-biased diode. In an alternative embodiment, a pair of N+ regions are formed within the P-tub, constituting a diode pair, and the temperature is detected by monitoring the difference in the voltages across the diodes. An overtemperature detection unit compares the voltage across the diode or diodes with a reference voltage and provides an output which can be used to turn the MOSFET off when the temperature reaches a predetermined level.
申请公布号 US6046470(A) 申请公布日期 2000.04.04
申请号 US19970946613 申请日期 1997.10.07
申请人 SILICONIX INCORPORATED 发明人 WILLIAMS, RICHARD K.;GRABOWSKI, WAYNE
分类号 H01L27/02;H01L29/78;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L31/113 主分类号 H01L27/02
代理机构 代理人
主权项
地址