发明名称 |
Environment exchange control for material on a wafer surface |
摘要 |
Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity). |
申请公布号 |
AU5905899(A) |
申请公布日期 |
2000.04.03 |
申请号 |
AU19990059058 |
申请日期 |
1999.09.01 |
申请人 |
SILICON VALLEY GROUP INC |
发明人 |
EMIR GURER;ED C. LEE;TOM ZHONG;REESE REYNOLDS;KEVIN GOLDEN;JOHN W. LEWELLEN;SCOTT C. WACKERMAN |
分类号 |
G03F7/039;G03F7/16;G03F7/20;G03F7/26;G03F7/38;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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