| 发明名称 |
DEPOSITION OF CARBONTITANIUM USING TI-BUTYLACIDICTITANIUM |
| 摘要 |
PURPOSE: A method is provided to deposit titanium dioxide using tertiary-butyric acid titanium. CONSTITUTION: The method comprises the process of contacting a gas produced by vaporizing tertiary-butyric acid titanium with a substrate which is maintained at a temperature ranging from 250 to 400 deg.C so that a titanium dioxide film is formed on the substrate by the thermo-chemical deposition.
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| 申请公布号 |
KR100250598(B1) |
申请公布日期 |
2000.04.01 |
| 申请号 |
KR19970031003 |
申请日期 |
1997.07.04 |
| 申请人 |
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY |
发明人 |
KIM, YOON-SOO;KO, WON-YONG;KOO, SOO-JIN |
| 分类号 |
C23C16/40;(IPC1-7):C23C16/40 |
主分类号 |
C23C16/40 |
| 代理机构 |
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