发明名称 PRODUCTION OF PHOTOSENSITIVE MACHINE PLATE AND TREATMENT OF WASTE LIQUID OR THE LIKE
摘要 PROBLEM TO BE SOLVED: To make it possible to industrially advantageously produce photosensitive machine plates by subjecting formed waste nitric acids and waste organic materials to a biological denitrification treatment stage, thereby treating the waste nitric acids and the waste organic materials. SOLUTION: The waste nitric acids and waste organic materials formed in the production stage for the photosensitive machine plates are treated by subjecting the waste nitric acids and waste organic materials to the biological denitrification treatment stage. Namely, for example, aluminum substrates 2 are carried into a nitric acid treatment tank 1 and the generated concentrated waste nitric acid solutions 5 are subjected to a neutralizing treatment by a caustic soda in a neutralizing treatment tank 6. The supernatant liquid 7 after the neutralizing treatment is then fed into a denitrification tank 13. On the other hand, the substrates are coated with a coating liquid containing an organic solvent by a coating device 9. Further, the substrates are dried by a drying device 11. The generated waste gases are fed into the denitrification tank 13. NO3- ions are reduced to nitrogen in the denitrification tank 13. The constitution based on the conventional methods may be adopted relating to the constitution of the denitrification tank 13.
申请公布号 JP2000089468(A) 申请公布日期 2000.03.31
申请号 JP19980257800 申请日期 1998.09.11
申请人 FUJI PHOTO FILM CO LTD 发明人 NARUSE YASUTO
分类号 C02F3/34;B41N3/03;G03F7/00;G03F7/09 主分类号 C02F3/34
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