发明名称 AMMONIA FOR MANUFACTURING GaN COMPOUND SEMICONDUCTOR AND MANUFACTURE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for manufacturing a GaN compound semiconductor, by which a GaN compound semiconductor having an excellent emitting property can be positively manufactured. SOLUTION: Ammonia for manufacturing a GaN compound semiconductor is filled into a container 18 in a state in which at least a part of the compound is liquid. Ammonia of the liquid phase has a moisture concentration of 0.5 volppm or less, that is measured by a Fourier transform infrared spectral method (FT-IR). The Ammonia is applied in a state of gas into a reacting chamber 11 including a substrate 1, and a layer made of the GaN compound is formed on the substrate 1 by using the Ammonia as a material.</p>
申请公布号 JP2000091235(A) 申请公布日期 2000.03.31
申请号 JP19980253027 申请日期 1998.09.07
申请人 SHOWA DENKO KK 发明人 HAYASHIDA HIDEKI;ITO TAIZO;SAKAGUCHI YASUYUKI
分类号 H01L21/205;G01N21/35;G01N21/3577;H01L21/208;(IPC1-7):H01L21/205 主分类号 H01L21/205
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