| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate treating system which can be improved in treating efficiency by finding out early the excess and deficiency of the number of substrate and a substrate counter which is most suitable for the treating system. SOLUTION: In a cleaning system which cleans wafers W of a substrate treating system, a wafer counter 31, which detects the number of wafer W housed in a carrier C which can house 25 wafers W is provided to a carrier carrying-in/out section 5 in and from which the carrier C, is carried. The counter 31 detects the number of the wafers W, by making 25 sets of light sources 45 and light receiving section 46, which are respectively arranged correspondingly to the 25 wafers W housed in the carrier C enter into the bottom opening 15 of the carrier C.</p> |
