| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection exposure apparatus with a reflective mask for obtaining a good image without reducing the resolution. SOLUTION: A projection exposure apparatus includes light sources 100, 101, and 102 for feeding a radiation light beam, lighting systems 4, 5, 6, and 8 for guiding the radiation light beam, a projection system 10 for guiding the radiation light beam reflected by the reflective mask 9 to an exposing substrate 11 and forming a given pattern on the exposed substrate 11, and scanning drive parts MT1 and MT2 for moving at least one of the reflective mask 9 and the exposed substrate 11 relatively. In this case the lighting system 4, 5, 6, and 8 have a visual field diaphragm 7 put near the conjugate position with the reflective mask 9.
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