| 摘要 |
PROBLEM TO BE SOLVED: To obtain an electron beam direct drawing device of a variable rectangular system capable of regulating electron beams readily and for a short time, and its regulating method. SOLUTION: This embodiment comprises an electron beam direct drawing device for irradiating electron beams emitted from an electronic gun on a sample by regulating it in a rectangular form by means of apertures 2, 5 having openings 9, 10 of a rectangular form, deflectors 3, 7, a rotary lens 4, and an objective lens 6. In this case, this embodiment is provided with a reflection electronic detector 8 for capturing electron beams reflected by a heavy metal step mark 14, a waveform rectifying circuit 12 for processing and calculating waveforms of a reflected electronic signal or primary and secondary differential waveforms, and a computer 11, and conditions that the electron beams become an optimal rectangular form are acquired from calculating results, and a voltage applied on the rotary lens is controlled.
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