发明名称 X-RAY MASK MANUFACTURING DEVICE AND METHOD
摘要 <p>PROBLEM TO BE SOLVED: To prevent an error due to a temperature change from occurring by providing a mechanism for applying a static voltage to a conductor block and that for controlling the level of a static voltage being applied according to the output of a surface height measurement mechanism. SOLUTION: A conductor block 16 is arranged at a part that opposes the reverse side of a mask 17, and a high DC voltage is applied by a high-voltage power source 15. Then, when the pressure of a fluid 21 for making constant the temperature of the mask is equal to zero, the interval between the reverse side of the mask 17 and the conductor block 16 is set to a specific distance. The output of a sensor 27 for monitoring potential in the direction of the face normal line at the center of the mask 17 being mounted to a mask holder 19 is read by a control computer 28 to control the high-voltage power supply 15 along with the output of a pressure gauge 24 and to control potential being fed to the conductor block 16. Also, the temperature of the conductor block 16 is made constant and that of the mask 17 is made constant, thus reducing an error in length dimension due to thermal expansion and stabilizing a resist process that is sensitive to temperature, namely improving a short dimension accuracy.</p>
申请公布号 JP2000091198(A) 申请公布日期 2000.03.31
申请号 JP19980256573 申请日期 1998.09.10
申请人 TOSHIBA CORP 发明人 MUROOKA KENICHI;SUNAOSHI HITOSHI
分类号 H01L21/027;G03F1/22;G03F1/76;G03F1/78;(IPC1-7):H01L21/027;G03F1/16;G03F1/08 主分类号 H01L21/027
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