发明名称 TREATING METHOD OF RESIST
摘要 PROBLEM TO BE SOLVED: To realize a method to fast and efficiently cure a resist without leaving gas produced by irradiation of electron beams in the resist when the resist is to be cured by irradiation of electron beams. SOLUTION: In the treating method of a resist to increase its heat resistance by irradiation of electron beams, the method includes a first process to irradiate the resist with electron beams while heating the resist to a temp. at which forming does not occur, a process to heat the resist to emit the gas produced in the first process to the outside of the resist, and a third process to irradiate the resist with electron beams to polymerize and cure the resist after the second process.
申请公布号 JP2000090414(A) 申请公布日期 2000.03.31
申请号 JP19980258996 申请日期 1998.09.11
申请人 USHIO INC 发明人 KOMORI MINORU
分类号 G11B5/31;G03F7/38;G03F7/40;H01B3/36;H01L21/027;(IPC1-7):G11B5/31 主分类号 G11B5/31
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