| 摘要 |
PROBLEM TO BE SOLVED: To prevent distortion or twist in a metal thin plate during secondary etching with respect to a long-hole type (aperture grill type) shadow mask. SOLUTION: The corrosion-resistant resin compsn. is prepared from reactive unsatd. oligomers and monomers having acryloyl groups or methacryloyl groups in the molecular ends or side chains of the molecular structure, a photopolymn. initiator selected from benzoin alkylethers, benzophenones and acetophenones, and an ester plasticizer selected from trimellitic acids, adipic acid and maleic acid. The obtd. compsn. is applied and dried on the face of the metal thin plate 1 where a small aperture pattern 5 is formed after primary etching so as to form an etching-resistant resin layer 7, and then the metal plate is subjected to secondary etching and peeling treatment to obtain a shadow mask. |
