发明名称 |
METHOD FOR SELECTING GAS-SUPPLYING TIME |
摘要 |
PROBLEM TO BE SOLVED: To cause the roughening of an etched sidewall or formed film to hardly occur by fixing pressure in a vacuum vessel. SOLUTION: The pressure in a vacuum vessel is measured by means of a vacuum gauge at execution of a transition process, and the pressure in the vessel is made constant by selecting the optimum transition process time, by extending the duration of the transition process as shown in (b) or shortening the duration as shown in (C), so that the pressure fluctuation in the vessel is less thanπ10% by feeding back the measured pressure to the next transition process and repeating this step.
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申请公布号 |
JP2000091326(A) |
申请公布日期 |
2000.03.31 |
申请号 |
JP19980259043 |
申请日期 |
1998.09.14 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
SUGIYAMA RYOICHI;KAI TAKAYUKI |
分类号 |
H01L21/302;C23C16/52;C23F4/00;G05B13/02;H01L21/205;H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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