PROCESSING TANK OF PHOTOSENSITIVE MATERIAL PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a processing tank which prohibit the contamination that the development processing liquid is mingled with the adjacent processing liquid tracing upstream along the swirling marks on the molded partition wall surfaces of the synthetic resin processing tanks by capillarity and surface tension without using a solvent which is harmful and is dangerous to handle. SOLUTION: This tank 1 is the processing tank of a photosensitive material processing device consisting of resin expansion molded articles which delineate at least one or above processing tanks from each other by means of the partition walls 5 and are integrally molded with these matters. Coating films 7 are formed on the surfaces of at least the partition walls 5 having the swirling marks by using a coating material composed mainly of the resin of the same material as the material of the partition walls 5, by which the surfaces are smoothed.