发明名称 Verfahren zur Herstellung einer Schattenmaske durch Ätzen einer Resistschicht
摘要 A steel sheet (1) of thickness 20-80 mu m is coated on each surface with a resist layer (2), e.g. of casein, and (Fig 1) one surface only is patternwise exposed to light through a glass mask (31), the resultant pattern of holes is developed (baked) and the unpatterned resist (2) is covered by coating or adhesive with a non-etchable layer of a resin (5), the patterned resist (2) is etched, e.g. with ferric chloride, and the resists and resin layer removed to provide a shadow mask (1) having etched through-holes. In a variant (Fig 4) a large opening (311) 3 -5 times the thickness of the sheet is patterned in a resist (21) on one side, one or more small openings (321, 322) patterned opposite thereto on the other resist, and etching is performed from each side; a layer of non-etchable material (4) is coated on the second side and into the small holes before a final etching from the first side; a large through-hole is formed. The resin covering (5) must resist pressure of etching solution and have strength to maintain the flatness of the sheet (1) and can be alkali- or solvent-soluble, UV-setting or hot-melt; an adhesive film should be anti-acid. The holes can be formed as a slot or slit and they have satisfactory accuracy of shape and dimension. The masks can be used for a large color cathode ray tube.
申请公布号 DE69230119(T2) 申请公布日期 2000.03.30
申请号 DE1992630119T 申请日期 1992.07.02
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 NAKAMURA, OSAMU;IKEMAGI, TAKESHI
分类号 G03F1/16;G03F1/20;H01J9/14;(IPC1-7):G03F1/16;G03F7/12 主分类号 G03F1/16
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