发明名称 HOT GAS REACTION DEVICE AND ITS UTILIZATION
摘要 <p>PROBLEM TO BE SOLVED: To secure a reaction having high selectivity and conversion by providing a source of a 1st gaseous reactant having a specific temp., a mixing chamber, where the reaction does not occur, and a reaction zone, where suffers the gas phase reaction in a reaction device, in the case of forming a uniform gaseous reactant mixture by reacting the 1st gaseous reactant with a 2nd gaseous reactant in the reaction device. SOLUTION: The 1st component in the reaction device is the source of the hot gaseous reactant (reactant A) having a temp. higher than 500 deg.C. The reactant A is injected to a mixing chamber of the reaction device as expansion jet. The expansion jet can be formed by providing an adjuster (such as a flow nozzle) between the hot gas source and the mixing chamber. The 2nd gaseous reactant (reactant B) in one of a gaseous state and a super critical state is injected near a place, where the reactant A is injected. In the mixing chamber, the reactant A and the reactant B does not react with each other substantially, though rapidly mix with each other. Next, the mixture of the reactant A with the reactant B is subjected to gas phase reaction in the reaction zone.</p>
申请公布号 JP2000084396(A) 申请公布日期 2000.03.28
申请号 JP19990250159 申请日期 1999.09.03
申请人 PRAXAIR TECHNOL INC 发明人 ANDERSON JOHN ERLING;FRANCIS ARTHUR WELLINGTON JR;WAGNER MATTHEW LINCOLN;LEGER CHRISTOPHER BRIAN
分类号 B01J3/00;B01J3/02;B01J12/00;B01J19/00;B01J19/26;(IPC1-7):B01J12/00 主分类号 B01J3/00
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