发明名称 INK JET HEAD AND INK JET RECORDER
摘要 PROBLEM TO BE SOLVED: To easily set a fluid resistance value of a fluid resistor by forming a groove to become the resistor of a specific direction on a silicon substrate of a crystal face orientation by anisotropically etching. SOLUTION: A silicon substrate of a crystal face orientation (110) is used as a first substrate 41 of the ink jet head. A discharging chamber 45, a liquid resistor 46, a common ink chamber 47 or the like are formed on the substrate 41 by anisotropically etching. The resistor 46 is a groove 50 formed in a <-110> direction forming an angle of 54.7 deg. to a <-11-2> direction. When the groove 50 of the <-110> direction is formed on the substrate of the crystal face orientation (110) in this manner, a (111) tapered face formed at 35.3 deg. to the (110) face is formed. At this time, when the two tapered faces are collided, its etching is stopped thereat. Accordingly, since a depth of the resistor 46 becomes a value decided according to its width, a calculation of optimizing a size of the resistor 46 can be facilitated.
申请公布号 JP2000085121(A) 申请公布日期 2000.03.28
申请号 JP19980254271 申请日期 1998.09.08
申请人 RICOH CO LTD 发明人 HASHIMOTO KENICHIRO
分类号 B41J2/045;B41J2/055;B41J2/14;B41J2/16;(IPC1-7):B41J2/045 主分类号 B41J2/045
代理机构 代理人
主权项
地址
您可能感兴趣的专利