发明名称 CLEAN ROOM AND PRODUCTION OF ETCHING PART USING IT
摘要 PROBLEM TO BE SOLVED: To prevent the outflow of foreign matters to the outside and to facilitate the control of the atmosphere in a clean room by pressurizing the inside of a cylindrical small chamber connected to the opening part of the bulkhead of a clean room cutting off the atmosphere with an adjacent chamber by clean air taken-in from the outer part 1. SOLUTION: A metallic thin sheet is cleaned and is subjected to affinitizing treatment to form a resist film, which is subjected to pattern exposure and development, and after that, etching is executed. In the producing process of this etching parts, e.g. the resist film forming stage 4 is executed in a clean room 11 divided by a bulkhead 12 having opening parts 14a and 14b and also introduced with clean air from an air feeding means 16, and the phenomenon that foreign matters from the outside are made to flow in and adhere to the film is prevented. Moreover, cylindrical small chambers 18a and 18b communicating with the opening parts 14a and 14b are formed, and clean air is introduced therein from air feeding means 17a and 17b. At this time, the atmospheric pressure in the small chamber 18 is set to approximately the same one as that in the space 13 in the bulkhead 12 or to the one higher than that in the adjacent chambers 30a and 30b.
申请公布号 JP2000087260(A) 申请公布日期 2000.03.28
申请号 JP19980260016 申请日期 1998.09.14
申请人 TOPPAN PRINTING CO LTD 发明人 NAKASO NOBUTAKA
分类号 E04H5/02;C23F1/00;H01L21/027;(IPC1-7):C23F1/00 主分类号 E04H5/02
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